Growth of a high quality quartz film on sapphire by catalyst-enhanced atmospheric-pressure vapor-phase epitaxy using buffer layers

Chemistry of Materials

Volumn 15, Issue 15, 2003, Pages 2889-2891

  Takahashi, Naoyuki ^a   Majima, Jun ^a   Nakumura, Takato ^a   Nonaka, Satoshi ^b   Yagi, Hiromi ^b   Shinriki, Yoichi ^b   Tamanuki, Katsumi ^b  

^a SHIZUOKA UNIVERSITY   (Japan)

^b Humo Laboratory Company   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CATALYSIS; QUARTZ; REFRACTIVE INDEX; SURFACE ROUGHNESS; VAPOR PHASE EPITAXY;

BUFFER LAYERS;

FILM GROWTH;

BUFFER; SILICON DIOXIDE;

ARTICLE; ATMOSPHERIC PRESSURE; CATALYST; FILM; PHASE TRANSITION; POLARIMETRY; STRUCTURE ANALYSIS; SURFACE PROPERTY; VAPOR; X RAY ANALYSIS;

EID: 0043269349     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm021712m     Document Type: Article

References (13)

1. Laudise, R. A.; Sullivan, R. A. Chem. Eng. Prog. 1989, 55, 55.
2. Ballman, A. A.; Laudise, R. A. Appl. Phys. Lett. 1966, 8, 53.
3. Ing, S. W.; Davern, W. J. Electrochem. Soc. 1965, 112, 284.
4. Secrist; D. R.; Mackenzie, J. D. J. Electrochem. Soc. 1966, 113, 914.
5. Backer, F. S.; Pawlink, D.; Anzinger, H.; Spitzer, A. J. Vac. Sci. Technol. B 1987, 5, 1555.
6. Fujino, K.; Nishimoto, Y.; Tokumatsu, N.; Maeda, K. J. Electrochem. Soc. 1990, 137, 2883.
7. Ray, S. K.; Maiti, C. K.; Lahiri, S. K.; Chakrabarti, N. B. J. Vac. Sci. Technol. B 1992, 10, 1139.
8. Kwok, K.; Yieh, E.; Robles, S.; Nguyen, B. C. J. Electrochem. Soc. 1994, 141, 2172.
9. Yoshimaru, M.; Yoshie, T. J. Electrochem, Soc. 1998, 145, 2847.
10. Wroble, A. M.; Pietrzykowska, A. W.; Wickramanayaka, S.; Hatanaka, Y. J. Electrochem. Soc. 1998, 145, 2866.
11. Takahashi, N.; Hoshogi, M.; Nakamura, T.; Momose, Y.; Nonaka, S.; Yagi, H.; Shinriuki, Y.; Tamanuki, K. J. Mater. Chem. 2002, 12, 719-722.
12. Laikin, M. J. Opt. Soc. Am. 1961, 51, 238.
13. Martens, F. A. Ann. Physik 1901, 6, 603.