SCOPUS 정보 검색 플랫폼

Volumn 12, Issue 3, 2002, Pages 719-722

Catalyst-enhanced vapor-phase epitaxy of quartz thin films under atmospheric pressure

(8) Takahashi, Naoyuki a Hoshogi, Masayuki a Nakumura, Takato a Momose, Yoshimi a Nonaka, Satoshi b Yagi, Hiromi b Sinriki, Yoichi b Tamanuki, Katsumi b

a SHIZUOKA UNIVERSITY (Japan)

b Humo Laboratory Company (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORIDE; SILICON DIOXIDE; WATER;

ARTICLE; ATMOSPHERIC PRESSURE; CATALYST; CHEMICAL STRUCTURE; ELECTRON DIFFRACTION; ENERGY; FILM; GROWTH; INFRARED SPECTROSCOPY; MEASUREMENT; TEMPERATURE; VAPOR; X RAY ANALYSIS; X RAY DIFFRACTION;

EID: 0036197999 PISSN: 09599428 EISSN: None Source Type: Journal
DOI: 10.1039/b108850p Document Type: Article

Times cited : (14)

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