Comparison of the ablation behaviour of 266 nm Nd : YAG and 193 nm ArF excimer lasers for LA-ICP-MS analysis

Journal of Analytical Atomic Spectrometry

Volumn 14, Issue 9, 1999, Pages 1369-1374

  Günther, Detlef ^a   Heinrich, Christoph A ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; EXCIMER LASERS; FRACTIONATION; GLASS; HELIUM; LASER ABLATION; LASER PRODUCED PLASMAS; NEODYMIUM LASERS; PHOTOIONIZATION; PLASMA DIAGNOSTICS;

CARRIER GASES; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY (ICP MS);

MASS SPECTROMETRY;

EID: 0043216512     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/A901649J     Document Type: Article

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