Preparation of phase-pure InSe thin films by MOCVD using a new single-source precursor [(Me)2In(μ-SeMe)]2

Bulletin of the Korean Chemical Society

Volumn 24, Issue 5, 2003, Pages 645-646

  Cho, Jung Young ^a   Jeong, Han Cheol ^a   Kim, Kyung Soo ^a   Kang, Dong Hee ^a   Kim, Hong Ki ^a   Shim, Il Wun ^a  

^a Chung Ang University   (South Korea)

Author keywords

MOCVD; Organometallic precursor; Phase pure InSe thin film

Indexed keywords

ALUMINUM DERIVATIVE; DIMETHYL DISELENIDE; INDIUM; SELENIDE; SELENIUM; TRIMETHYLALUMINUM; UNCLASSIFIED DRUG;

ARTICLE; CARBON NUCLEAR MAGNETIC RESONANCE; FILM; METAL ORGANIC CHEMICAL VAPOR DEPOSITION; PHASE TRANSITION; PROCESS MONITORING; PROTON NUCLEAR MAGNETIC RESONANCE; PURIFICATION; STRUCTURE ANALYSIS; SYNTHESIS; VAPORIZATION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0043093902     PISSN: 02532964     EISSN: None     Source Type: Journal    
DOI: 10.5012/bkcs.2003.24.5.645     Document Type: Article

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