Expansion of SU-8 application scope by PAG concentration modification

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4979, Issue , 2003, Pages 402-409

  Ling, Zhong Geng ^a   Lian, Kun ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

Minimum bottom dose; PAG concentration; PEB temperature and time; SU 8 modification; UV absorption

Indexed keywords

CONCENTRATION (PROCESS); CRYSTAL MICROSTRUCTURE; LIGHT ABSORPTION; OPTIMIZATION; PHOTOLITHOGRAPHY; PHOTORESISTS; TEMPERATURE; X RAY LITHOGRAPHY;

PHOTOACIDGENERATOR; POST EXPOSURE BAKE TEMPERATURE; ULTRAVIOLET ABSORPTION;

MICROMACHINING;

EID: 0043064235     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.478254     Document Type: Conference Paper

References (12)

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2. N. LaBianca, and J. D. Gelorme, "High aspect ratio resist for thick film applications," SPIE 2438, pp. 846-852 1995
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8. Larry F. Thompson, C. Grant Willson and Murrae J. Bowden, Introduction to Microlithography, Second Edition, p.161, ACS Professional Reference Book, American Chemical Society, Washington, DC 1994.
9. Contact Pascal Meyer at pascal.meyer@imt.fzk.de (Institute for Microstructure Technology, Research Center, Karlsruhe, Germany)
10. A. Schneider, B. Su, T. Button, L. Singleton, O. Wilhelmi, S. Hug, P. Prewett and R. Lawes, "Comparison of PMMA and SU-8 resist moulds for embossing of PZT to produce high-aspect-ratio microstructure, using LIGA process", Microsystem Technologies 8, pp.88-92, 2002
11. Larry F. Thompson, C. Grant Willson and Murrae J. Bowden, Introduction to Microlithography, Second Edition, p.243, ACS Professional Reference Book, American Chemical Society, Washington, DC 1994.
12. V. Seidemann, J. Rabe, M. Feldmann and S. Buttgenbach, "SU8-micromechanical structures with in situ fabricated movable parts", Microsystem Technologies 8 pp.348-350, 2002