Energetic neutral fluxes towards surfaces in a magnetically enhanced reactive ion etch-like reactor

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 1205-1209

  Sabisch, Winfried ^a   Kratzer, Matthias ^a   Brinkmann, Ralf Peter ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; CONDUCTIVE MATERIALS; DIELECTRIC MATERIALS; DRY ETCHING; MAGNETIC PROPERTIES; MATHEMATICAL MODELS; MICROELECTRONICS; MONTE CARLO METHODS; NUMERICAL ANALYSIS; PARTICLES (PARTICULATE MATTER);

ENERGETIC NEUTRAL FLUXES; MAGNETICALLY ENHANCED REACTIVE ION ETCH LIKE REACTOR;

REACTIVE ION ETCHING;

EID: 0043032428     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1565153     Document Type: Article

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