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Volumn 21, Issue 4, 2003, Pages 1545-1549

In situ studies of the amorphous to microcrystalline transition of hot-wire chemical vapor deposition Si:H films using real-time spectroscopic ellipsometry

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; ELLIPSOMETRY; MORPHOLOGY; PHASE TRANSITIONS; RAMAN SCATTERING; SILICON; SURFACE ROUGHNESS;

EID: 0043031301     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1564037     Document Type: Article
Times cited : (7)

References (9)
  • 1
    • 0041893664 scopus 로고    scopus 로고
    • edited by J. P. Conde, H. Masumura, and A. H. Mahan (Elsevier Science, B. B. The Netherlands); (Thin Solid Films)
    • Proceedings of the First International Conference on Cat-CVD (Hot-Wire CVD) Process, edited by J. P. Conde, H. Masumura, and A. H. Mahan (Elsevier Science, B. B. The Netherlands, 2001) (Thin Solid Films Vol. 395).
    • (2001) Proceedings of the First International Conference on Cat-CVD (Hot-Wire CVD) Process , vol.395


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.