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Volumn 21, Issue 4, 2003, Pages 1545-1549
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In situ studies of the amorphous to microcrystalline transition of hot-wire chemical vapor deposition Si:H films using real-time spectroscopic ellipsometry
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS MATERIALS;
ATOMIC FORCE MICROSCOPY;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL GROWTH;
CRYSTAL STRUCTURE;
CRYSTALLINE MATERIALS;
ELLIPSOMETRY;
MORPHOLOGY;
PHASE TRANSITIONS;
RAMAN SCATTERING;
SILICON;
SURFACE ROUGHNESS;
AMORPHOUS TO MICROCRYSTALLINE TRANSITION;
CRYSTALLINITY;
HOT WIRE CHEMICAL VAPOR DEPOSITION;
REAL TIME SPECTROSCOPIC ELLIPSOMETRY;
THIN FILMS;
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EID: 0043031301
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1564037 Document Type: Article |
Times cited : (7)
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References (9)
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