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Materials Research Society Symposium - Proceedings

Volumn 715, Issue , 2002, Pages 159-164

Real time spectroscopic ellipsometry of amorphous silicon grown at high deposition rates by hot-wire CVD

(2) Nelson, Brent P a Levi, Dean H a

a NATIONAL RENEWABLE ENERGY LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; ELECTRONIC PROPERTIES; ELLIPSOMETRY; FILM GROWTH; HYDROGENATION; NUCLEATION; OPTICAL PROPERTIES; SURFACE ROUGHNESS; THICKNESS MEASUREMENT;

HOT WIRE CHEMICAL VAPOR DEPOSITION; PHOTORESPONSE; REAL TIME SPECTROSCOPIC ELLIPSOMETRY;

AMORPHOUS SILICON;

EID: 0036920092 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: 10.1557/proc-715-a17.3 Document Type: Conference Paper

Times cited : (4)

References (10)

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2
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