Humidity dependence of microwear characteristics of amorphous carbon films on silicon substrates

Wear

Volumn 254, Issue 10, 2003, Pages 1042-1049

  Tsuchitani, Shigeki ^a   Sogawa, Yasuyuki ^a   Kaneko, Reizo ^a   Hirono, Shigeru ^b   Umemura, Shigeru ^c  

^a WAKAYAMA UNIVERSITY   (Japan)

^b Advanced Film Technology Inc   (Japan)

^c CHIBA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous carbon; Atomic force microscope; Humidity; Hydrogen content; Wear

Indexed keywords

ATMOSPHERIC HUMIDITY; ATOMIC FORCE MICROSCOPY; CARBON; SILICON; SUBSTRATES; THIN FILMS; WEAR RESISTANCE;

ENVIRONMENTAL HUMIDITY;

WEAR OF MATERIALS;

ATOMIC FORCE MICROSCOPY; CARBON; FILM; HUMIDITY; SCRATCHING; SPUTTERING; WEAR RESISTANCE;

EID: 0043022095     PISSN: 00431648     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0043-1648(03)00310-7     Document Type: Article

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