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Volumn , Issue , 2003, Pages 32-35

Record-low 4 mω·mm2 specific on-resistance for 20V trench MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CHARGE; ELECTRIC RESISTANCE; LITHOGRAPHY; SEMICONDUCTOR DOPING; SWITCHING;

EID: 0042941448     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (16)

References (8)
  • 1
    • 0005415615 scopus 로고    scopus 로고
    • Optimisation of N-channel trench MOS for power applications
    • R.J.E. Hueting et al., "Optimisation of N-Channel Trench MOS for Power Applications", ESSDERC, pp. 388-391, 2000.
    • (2000) ESSDERC , pp. 388-391
    • Hueting, R.J.E.1
  • 2
    • 0026158322 scopus 로고
    • Trench DMOS transistor technology for high-current (100 A) switching
    • C. Bulucea and R. Rossen, "Trench DMOS Transistor Technology for High-Current (100 A) Switching", Solid-State Electronics, vol. 34, no. 5, pp. 493-507, 1991.
    • (1991) Solid-state Electronics , vol.34 , Issue.5 , pp. 493-507
    • Bulucea, C.1    Rossen, R.2
  • 3
    • 3042629522 scopus 로고
    • The mobility model in MINIMOS
    • J.W. Slotboom and G. Streutker, "The Mobility Model in MINIMOS", ESSDERC, pp. 87-91, 1989.
    • (1989) ESSDERC , pp. 87-91
    • Slotboom, J.W.1    Streutker, G.2
  • 4
    • 0001633790 scopus 로고
    • The scattering of electrons by surface oxide charges and lattice vibrations at the silicon-silicon dioxide interface
    • C.T. Sah, T.H. Ning and L.L. Tschopp, "The scattering of electrons by surface oxide charges and lattice vibrations at the silicon-silicon dioxide interface", Surface Science, vol 32, pp. 561-575, 1972.
    • (1972) Surface Science , vol.32 , pp. 561-575
    • Sah, C.T.1    Ning, T.H.2    Tschopp, L.L.3
  • 5
    • 0026205305 scopus 로고
    • Physical understanding of low-field carrier mobility in silicon MOSFET inversion layer
    • K. Lee et al., "Physical understanding of low-field carrier mobility in silicon MOSFET inversion layer", IEEE trans. on electr. dev., vol. 38, no 8, pp. 1905-1912, 1991.
    • (1991) IEEE Trans. on Electr. Dev. , vol.38 , Issue.8 , pp. 1905-1912
    • Lee, K.1
  • 6
    • 0034829322 scopus 로고    scopus 로고
    • An ultra dense trench-gated power MOSFET technology using a self-aligned process
    • J. Zeng et al., "An Ultra Dense Trench-Gated Power MOSFET Technology Using A Self-Aligned Process", ISPSD, p. 147-150, 2001.
    • (2001) ISPSD , pp. 147-150
    • Zeng, J.1
  • 7
    • 0036049980 scopus 로고    scopus 로고
    • Fully self-aligned power trench-MOSFET utilising 1 μm pitch and 0.2 μm trench width
    • S. Peake et al., "Fully Self-Aligned Power Trench-MOSFET Utilising 1 μm Pitch and 0.2 μm Trench Width", ISPSD, p. 29-32, 2002.
    • (2002) ISPSD , pp. 29-32
    • Peake, S.1
  • 8
    • 0036047476 scopus 로고    scopus 로고
    • Low on-resistance and low feedback-charge, lateral power MOSFETs with multi-drain regions For high-efficient DC/DC converters
    • K. Sakamoto et al., "Low On-Resistance And Low Feedback-Charge, Lateral Power MOSFETs With Multi-Drain Regions For High-Efficient DC/DC Converters", ISPSD, p. 25-28, 2002
    • (2002) ISPSD , pp. 25-28
    • Sakamoto, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.