Using MeV ion backscattering/channeling and MC simulations to characterize the composition and structure of buried metal-metal interfaces

Applied Surface Science

Volumn 219, Issue 1-2, 2003, Pages 28-38

  Smith, R J ^a   Ramana, C V ^a   Choi, Bum sik ^a,b   Saleh, Adli A ^a,c   Shivaparan, N R ^a,d   Shutthanandan, V ^a,e  

^a MONTANA STATE UNIVERSITY   (United States)

^b Jeonju University   (South Korea)

^c CHARLES EVANS AND ASSOCIATES   (United States)

^d New Jersey Transit   (United States)

^e PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

Ag; Al; Fe; High energy ion scattering; Metal metal interfaces; Ni; Ti; X ray photoelectron spectroscopy

Indexed keywords

ALUMINUM; COMPUTER SIMULATION; DEPOSITION; EPITAXIAL GROWTH; INTERFACES (MATERIALS); MONTE CARLO METHODS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SINGLE CRYSTALS; STOICHIOMETRY; SURFACES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

METAL-METAL INTERFACES;

SURFACE STRUCTURE;

EID: 0042864455     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00629-9     Document Type: Conference Paper

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