Atmospheric pressure PA-CVD of silicon- and carbon-based coatings using dielectric barrier discharges

New Diamond and Frontier Carbon Technology

Volumn 13, Issue 4, 2003, Pages 175-189

  Klages, C P ^a   Eichler, M ^a   Thyen, R ^a,b  

^a INSTITUTO SUPERIOR TÉCNICO   (Portugal)

^b CS Solartechnik GmbH   (Germany)

Author keywords

Atmospheric pressure plasma; Corrosion protection; Dielectric barrier discharge; PA CVD amorphous hydrocarbon; Surface functionalization

Indexed keywords

ADHESION; AMORPHOUS MATERIALS; ATMOSPHERIC PRESSURE; CARBON; CORROSION PROTECTION; ELECTRIC DISCHARGES; FUNCTIONALLY GRADED MATERIALS; PLASMAS; POLYAMIDES; SILICON;

AMORPHOUS HYDROCARBON; CARBON BASED COATINGS; DIELECTRIC BARRIER DISCHARGES; SURFACE FUNCTIONALIZATION;

CHEMICAL VAPOR DEPOSITION;

EID: 0042745455     PISSN: 13449931     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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