Improvement of the homogeneity of optical thin films by ion-assisted deposition

Journal of Modern Optics

Volumn 43, Issue 6, 1996, Pages 1149-1154

  Lee, Cheng Chung ^a,b   Liou, Yeuh Yeong ^a   Jaing, Cheng Chung ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b ChienKuo Coll of Technol and Comm   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DEPOSITION; ION BEAMS; ION BOMBARDMENT; OPTICAL COATINGS; THIN FILMS; TITANIUM DIOXIDE; ZIRCONIA;

ION ASSISTED DEPOSITION; TRANSMISSION MONITORING CURVES;

OPTICAL FILMS;

EID: 0030168641     PISSN: 09500340     EISSN: 13623044     Source Type: Journal    
DOI: 10.1080/09500349608232793     Document Type: Article

References (25)

1. Pearson, J. M., 1970. Thin Solid Films, 5:349
2. Lissberger, P. H., and Pearson, J. M., 1976. Thin Solid Films, 34:349
3. Gunther, K. H., and Pulker, H. K., 1976. Appl. Opt., 15:2992
4. Borgogno, J. P., Lazarides, B., and Pelletier, E., 1982. Appl. Opt., 21:4020
5. Klinger, R. E., and Carniglia, C. K., 1985. Appl. Opt., 24:3184
6. Stetter, F., Esselborn, R., Harder, N., Friz, M., and Tolles, P., 1976. Appl. Opt., 15:2315
7. Arndt, D. P., 1984. Appl. Opt., 23:3571
8. Bennett, J. M., 1989. Appl. Opt., 28:3303
9. Ying, X., Feldman, A., and Farabaugh, E. N., 1990. J. Appl. Phys., 67:2056
10. Piegari, A., and Emiliani, G., 1989. Thin Solid Films, 171:243
11. Parjadis De Lariviere, G., Frigerio, J. M., Rivory, J., and Abeles, F., 1992. Appl. Opt., 31:6056
12. Bovard, B., Van Milligen, F. J., Messerly, M. J., Saxe, S. G., and Macleod, H. A., 1985. Appl. Opt., 24:1803
13. Liou, Y. Y., Lee, C. C., Jaing, C. C., Chu, C. W., and Hsu, J. C., 1995. Jpn. J. Appl. Phys., 34 Suppl. 2, Pt. 1, 1952
14. Allen, T. H., 1983. Proc. Int. Ion Eng. Congr.,:1305
15. McNeil, J. R., Barron, A. C., Wilson, S. R., and Herrmann, W. C., Jr. 1984. Appl. Opt., 23:552
16. Martin, P. J., Netterfield, R. P., and Sainty, W. G., 1984. J. Appl. Phys., 55:235
17. Netterfield, R. P., Sainty, W. G., Martin, P. J., and Sie, S. H., 1985. Appl. Opt., 24:2267
18. Martin, P. J., and Netterfield, R. P., 1991. Thin Solid Films, 199:351
19. Flory, F., Pelletier, E., Albrand, G., and Hu, Y., 1989. Appl. Opt., 28:2952
20. Martin, P. J., Netterfield, R. P., Kinder, T., and Bendavid, A., 1992. Appl. Opt., 31:6734
21. Bovard, B., 1995. Ion Assisted Deposition in Thin Films for Optical Systems, Edited by:Flory, F., Marcel Dekker Inc.
22. Matl, K., Klug, W., and Zoller, A., 1991. Materials Science and Engineering A, 140:523
23. Pulker, H. K., Lardon, M., Buhl, R., and Moll, E., 1986. J. Vac. Sci. Technol. A, 4(6):2922
24. Hwangbo, C. K., Lingg, L. J., Lehan, J. P., Macleod, H. A., Makous, J. L., and Kim, S. Y., 1989. Appl. Opt., 28:2769
25. Lee, C. C., Liou, Y. Y., Jaing, C. C., and Chu, C. W., Dec. 12 1994. 1994, 7th Int. Conf. on Solid Films and Surfaces Dec. 12, 1–17. Taiwan, R.O.C. 280.