Radio frequency plasma processing effects on the emission characteristics of a MeV electron beam cathode

Applied Physics Letters

Volumn 75, Issue 1, 1999, Pages 31-33

  Rintamaki, J I ^a,b   Gilgenbach, R M ^b   Cohen, W E ^b   Jaynes, R L ^b   Cuneo, M E ^c   Menge, P R ^c  

^a GENERAL ELECTRIC COMPANY   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042708335     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124267     Document Type: Article

References (12)

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