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Materials Science and Engineering: A

Volumn 357, Issue 1-2, 2003, Pages 355-364

High-temperature oxidation behavior of low-energy high-flux nitrided Ni and Ni-20% Cr substrates

(5) Pedraza, F a Reffass, M a Balmain, J a Bonnet, G a Dinhut, J F a

a UNIVERSITÉ DE LA ROCHELLE (France)

Author keywords

High temperature oxidation; Implantation; Ni 20at. Cr; Nickel nitriding; Nitridation

Indexed keywords

CHROMIUM; NICKEL; NITRIDING; OXIDATION; POROSITY; SUBSTRATES;

NITRIDATION;

HIGH TEMPERATURE EFFECTS;

HIGH TEMPERATURE APPLICATION; KINETICS; MORPHOLOGY; NITRIDING; OXIDATION; POROSITY; PRECIPITATION;

EID: 0042567559 PISSN: 09215093 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-5093(03)00229-6 Document Type: Article

Times cited : (13)

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