High resolution x-ray masks for high aspect ratio microelectromechanical systems (HARMS)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4979, Issue , 2003, Pages 508-513

  Wang, Lin ^a   Aristone, Flavio ^a   Goettert, Jost ^a   Kong, Jong Ren ^a   Bradshaw, Keith ^b   Christenson, Todd ^c   Desta, Yohannes M ^a   Jin, Yoonyoung ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

^b The University of Texas at Dallas   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

E beam lithography; HARMS; Intermediate mask; X ray lithography

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; GOLD PLATING; MASKS; MICROELECTROMECHANICAL DEVICES;

HIGH ASPECT RATIO MICROELECTROMECHANICAL SYSTEMS; HIGH RESOLUTION X-RAY INTERMEDIATE MASKS; INITIAL MASK; LASER LITHOGRAPHIC TECHNIQUES;

X RAY LITHOGRAPHY;

EID: 0042563344     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.478268     Document Type: Conference Paper

References (2)

1. Eijiro Toyota and Toshitada Hori, Technique for 25nm x-ray nanolithography, J. Vac. Sci. Technol. B 19(6) Nov/Dec 2001 2428-2433
2. C. G. Khan Malek and S.S. Das, Adhesion promotion between poly(methylmethacrylate) and metallic surfaces for Liga evaluated by shear stress measurements, J. Vac. Sci. Technol. B 16(6) Nov/Dec 1998 3543-3546