I-V and C-V properties of TiO2 thin film by pulsed-laser reactive deposition

Chinese Science Bulletin

Volumn 43, Issue 16, 1998, Pages 1344-1349

  Fu, Zhengwen ^a   Zhou, Mingfei ^a   Zhang, Shengkun ^a   Chen, Lianyao ^a   Qin, Qizong ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

Dielectric properties; Electrical properties; Pulsed laser deposition; TiO2

Indexed keywords

APOIDEA;

EID: 0042489641     PISSN: 10016538     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02883679     Document Type: Article

References (11)

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