Cost-effective mask fabrication on Kapton membrane for deep X-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3225, Issue , 1997, Pages 102-108

  Stadler, S ^a   Derhalli, I ^a   Malek, C Khan ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

Gold electroplating; Liga; Negative photoresist; Sputter deposition; X ray mask

Indexed keywords

COST EFFECTIVENESS; ELECTROPLATING; FABRICATION; GERMANIUM COMPOUNDS; MASKS; MICROMACHINING; PHOTORESISTS; POLYIMIDES; SPUTTER DEPOSITION; X RAYS;

DEEP X-RAY LITHOGRAPHY; DIMENSIONAL CHANGES; GOLD ELECTROPLATING; LIGA; MASK FABRICATION; NEGATIVE PHOTORESISTS; RADIATION RESISTANCE; X RAY MASK;

X RAY LITHOGRAPHY;

EID: 0042480065     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.284546     Document Type: Conference Paper

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