Micromachined, silicon filament light source for spectrophotometric microsystems

Applied Optics

Volumn 42, Issue 13, 2003, Pages 2388-2397

  Tu, Juliana ^a   Howard, Dwight ^a   Collins, Scott D ^a   Smith, Rosemary L ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC POTENTIAL; FILAMENTS (LAMP); MICROMACHINING; SILICON; SPECTROPHOTOMETRY;

SILICON FILAMENT LIGHT SOURCES;

OPTICAL SYSTEMS;

EID: 0042472163     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.42.002388     Document Type: Article

References (25)

1. H. A. Szymanski, IR Theory and Practice of Infrared Spectroscopy (Plenum, New York, 1964).
2. R. T. Conley, Infrared Spectroscopy, 2nd ed. (Allyn and Bacon, Boston, Mass., 1972).
3. C. E. Meloan, Elementary Infrared Spectroscopy (Macmillan, New York, 1963).
4. T. S. Kuhn, Black-Body Theory and The Quantum Discontinuity 1894-1912 (Clarendon, Oxford, 1978).
5. H. Kaplan, “Photonics at work—advanced blackbody reference sources,” Photon. Spectra 24, 92-96 (1990).
6. W. L. Wolfe and G. J. Zissis, The Infrared Handbook (U.S. Government Printing Office, Washington, D.C., 1978).
7. J. H. van der Maas, Basic Infrared Spectroscopy (Heyden, London, 1969).
8. H. C. Ohanian, Physics (Norton, New York, 1985).
9. P. Bouchut, G. Destefanis, J. P. Chamonal, A. Million, B. Pel-liciari, and J. Piaguet, “High-efficiency infrared light emitting diodes made in liquid phase epitaxy and molecular beam epitaxy Hg-Cd-Te Layers,” J. Vac. Sci. Technol. B 9, 1794-1798 (1991).
10. P. M. Alt and P. Pleshko, “Performance and design considerations of the thin-film tungsten matrix display,” IEEE Trans. Electron Dev. ED-20, 1006-1015 (1973).
11. F. Hochberg, H. K. Seitz, and A. V. Brown, “A thin-film integrated incandescent display,” IEEE Trans. Electron Dev. ED-20, 1002-1005 (1973).
12. H. Guckel and D. W. Burns, “Integrated transducers based on blackbody radiation from heated polysilicon films,” presented at Transducers’85 meeting, Philadelphia, Pa., 11-14 June 1985.
13. G. Lamb, M. Jhabvala, and A. Burgess, “Integrated-circuit broadband infrared source,” Tech. Brief (NASA, Washington, D.C., 1989).
14. C. H. Mastrangelo, J. H.-J. Yeh, and R. S. Muller, “Electrical and optical characteristics of vacuum-sealed polysilicon microlamps,” IEEE Trans. Electron Dev. 39, 1363-1375 (1992).
15. P. Y. Chen and R. S. Muller, “Microchopper-modulated IR microlamp,” presented at the Solid-State Sensor and Actuator Workshop, Hilton Head, S.C., 13-16 June 1994.
16. T. Corman, E. Kalvesten, M. Huiku, K. Weckstrom, P. T. Mer-ilainen, and G. Stemme, “An optical IR-source and CO2-chamber system for CO2 measurements,” J. Microelectromech. Syst. 9, 509-516 (2000).
17. S. D. Collins, “Etch stop techniques for micromachining,” J. Electrochem. Soc. 144, 2242-2262 (1997).
18. E. Bassous and A. C. Lamberti, “Highly selective KOH-based etchant for boron-doped silicon structures,” Microelectron. Eng. 9, 167-170 (1989).
19. S. Wolf and R. N. Tauber, Process Technology, Vol. 1 of Silicon Processing for the VLSI Era (Lattice Press, Sunset Beach, Calif., 1986), p. 192.
20. Sadtler Research Laboratories, Infrared Spectra Handbook of Inorganic Compounds (Sadtler Research Laboratories, Philadelphia, Pa., 1984), p. 86.
21. R. F. Wolffenbuttel and K. D. Wise, “Low-temperature silicon wafer-to-wafer bonding using gold at eutectic temperature,” Sensors Actuators A 43, 223-229 (1994).
22. D. E. Roller and R. Blum, Physics: Mechanics, Waves, and Thermodynamics (Holden-Day, San Francisco, Calif., 1981), Vol. 1.
23. M. N. Wybourne, “Thermal conductivity of silicon,” in Properties of Silicon (Institute of Electrical Engineers, London, 1987), pp. 37-39.
24. P. Olckers, A. M. Ferber, V. K. Dmitriev, and G. Kierpilenko, “A photoacoustic gas sensing silicon microsystem,” presented at the Transducers’01 meeting, Munich, Germany, 10-14 June 2001.
25. A. M. Ferber, P. Olckers, H. Rogne, and M. H. Lloyd, “A miniature silicon photoacoustic detector for gas monitoring applications,” Meas. Control 34, 44-46 (2001).