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Volumn 750, Issue , 2002, Pages 561-566

Metrology issues in Cu-low-k chemical mechanical planarization

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; DIELECTRIC MATERIALS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICA; TRIBOLOGY;

EID: 0042466532     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-750-y9.7     Document Type: Conference Paper
Times cited : (1)

References (12)
  • 4
    • 0041494442 scopus 로고    scopus 로고
    • Solid state Technol 41(10) (1998) 64
    • (1998) Solid State Technol , vol.41 , Issue.10 , pp. 64
  • 8
    • 0042997061 scopus 로고    scopus 로고
    • Symposium E fundamentals and materials issues in chemical-mechanical polishing of materials
    • San Francisco, CA, Apr. 24-28
    • U. Mahajan, S.-M. Lee, R.K. Singh, Symposium E Fundamentals and Materials Issues in Chemical-Mechanical Polishing of Materials. MRS Spring 2000 Meeting, San Francisco, CA, Apr. 24-28, 2000
    • (2000) MRS Spring 2000 Meeting
    • Mahajan, U.1    Lee, S.-M.2    Singh, R.K.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.