Formation of microlens by reflow of dual photoresist

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 4044-4047

  Hocheng, Hong ^a   Pan, Cheng Tan ^b,c   Cheng, Chi Cheng ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Aspect ratio; Dual layer; Microlens; Photoresist; Reflow

Indexed keywords

ASPECT RATIO; INTERFACES (MATERIALS); PHOTORESISTS; SURFACE TENSION;

PHOTORESIST REFLOW;

MICROLENSES;

EID: 0042362181     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4044     Document Type: Conference Paper

References (6)

1. N. F Borrelli. D. L. Morse, R. H. Bellman and W. L. Morgen: Appl. Opt. 24 (1985) 2520.
2. J. O. Choi, J. A. Morse, J. C. Corelli, J. P. Silverman and H. Bakhru: J. Vac. Sci. Technol. B6 (1988) 3633.
3. M. Hutley, R. Stevens and D. Daly: Phys. World 4 (1991) no. 7, 27.
4. M. C. Hutley: J. Mod. Opt. 37 (1990) 253.
5. Y. S. Lin, C. T. Pan, K. L. Lin, S. C. Chen, J. J. Yang and J. P. Yang: IEEE Trans. Micro-Optoelectromech. Syst. (2001) 337.
6. C. T. Pan, S. C. Shen, M. C. Chou and H. P. Chou: J. Magn. & Magn. Mater. (2001) 610.