Deep Silicon Etching in Inductively Coupled Plasma Reactor for MEMS

Physica Scripta T

Volumn 79, Issue , 1999, Pages 250-254

  Kiihamaki J ^a   Franssila, S ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042340423     PISSN: 02811847     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (17)

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