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Volumn 82, Issue 2, 1997, Pages 655-657
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Properties of chemically deposited Cu2S films on porous silicon
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0042277090
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.365594 Document Type: Article |
Times cited : (21)
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References (13)
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