Mechanisms of strain induced roughening and dislocation multiplication in SixGe1-x thin films

Journal of Electronic Materials

Volumn 26, Issue 9, 1997, Pages 1039-1047

  Jesson, D E ^a   Chen, K M ^a   Pennycook, S J ^a   Thundat, T ^a   Warmack, R J ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Heteroepitaxy; Interface roughening; SiGe

Indexed keywords

EID: 0042275700     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-997-0241-2     Document Type: Article

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