Surface contaminant detection in semiconductors using noncontacting techniques

Journal of the Electrochemical Society

Volumn 150, Issue 8, 2003, Pages

  Cavalcoli, D ^b   Cavallini, A ^b   Rossi, M ^b   Binetti, S ^a   Izzia, F ^c   Pizzini, S ^a  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

^b UNIVERSITY OF BOLOGNA   (Italy)

^c Thermo Optek Italia spa   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORESCENCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IMPURITIES; NONDESTRUCTIVE EXAMINATION; OPTICAL VARIABLES MEASUREMENT; SURFACES;

NONCONTACTING TECHNIQUES; SCANNING KELVIN PROBE TECHNIQUE; SURFACE CONTAMINATION; ULTRAVIOLET FLUORESCENCE TECHNIQUE;

SILICON WAFERS;

EID: 0042200428     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1587727     Document Type: Article

References (11)

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