Statistical approach for the optimal deposition of Cr underlayer for SmCo/Cr magnetic films

Applied Surface Science

Volumn 218, Issue 1-4, 2003, Pages 29-33

  Xu, Xiao Hong ^a,b   Wu, Hai Shun ^a   Duan, Jing Fang ^a   Wang, Fang ^a   Jin, Fang ^b   Lee, Zuo Yi ^b  

^a SHANXI NORMAL UNIVERSITY   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Coercivity; Cr underlayer; SmCo Cr films; Sputtering factors

Indexed keywords

MAGNETIC FILMS; SAMARIUM COMPOUNDS; SPUTTERING; STATISTICAL METHODS;

SPUTTERING PRESSURE;

CHROMIUM;

EID: 0042193668     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00588-9     Document Type: Article

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