In situ curvature and diffraction studies of Pd films on Si(001) during solid-state reaction

Materials Research Society Symposium-Proceedings

Volumn 615, Issue , 2000, Pages G831-G836

  Gergaud, P ^a   Thomas, O ^a   Chenevier, B ^a   Ghetta, V ^c   Mouroux, A ^d   Zhang, S L ^d  

^a CNRS   (France)

^b UNIV GRENOBLE ALPES   (France)

^c ENSPG ^*

^d ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; CRYSTALLINE MATERIALS; PALLADIUM; SEMICONDUCTING SILICON; SOLID STATE PHYSICS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

SOLID-STATE REACTIONS;

METALLIC FILMS;

EID: 0034429055     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-615-g8.3.1     Document Type: Article

References (10)