Micropatterning by wettability control of the SiO2 surface with ultraviolet irradiation

Surface Review and Letters

Volumn 10, Issue 4, 2003, Pages 569-570

  Huang, Lan ^a   Zhang, Yu ^a   Liao, Jianhui ^a   Xu, Lina ^a   Gu, Ning ^a   Shen, Haojing ^b  

^a SOUTHEAST UNIVERSITY   (China)

^b NANJING ELECTRONIC DEVICES INSTITUTE   (China)

Author keywords

Assembly; Micropattern; Ultraviolet irradiation

Indexed keywords

MICROELECTRONICS; PATTERN MATCHING; ULTRAVIOLET RADIATION; WETTING;

MICROPATTERNING;

SURFACE PHENOMENA;

OXYGEN; SILICON DIOXIDE;

ARTICLE; ELECTRONICS; INTEGRATED CIRCUIT; PATTERN GENERATOR; PHENOMENOLOGY; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET IRRADIATION; WETTABILITY;

EID: 0041836115     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0218625X03005414     Document Type: Article

References (6)

1. T. D. Blake, A. Clarke and E. H. Stattersfield, Langmuir 16, 2928 (2000).
2. M. Schneemilch, W. J. J. Welters, R. A. Hayes and J. Ralston, Langmuir 16, 2924 (2000).
3. A. M. Cazabat, F. Heslot, S. M. Troian and P. Carles, Nature 346, 824 (1990).
4. M. K. Chaudhury and G. M. Whitesides, Science 256, 1539 (1992).
5. R. Wang, K. Hashimoto, A. Fujishisma, M. Chikuni, E. Kojima, A. Kitamura, M. Shimohigoshi and T. Watanabe, Nature 338, 431 (1997).
6. M. Miyauchi, N. Kieda, S. Hishita, T. Mitsuhasli, A. Nakajima, T. Watanabe and K. Hashimoto, Surf. Sci. 511, 401 (2002).