Characterization of the plasma during the growth of CNx films by RF magnetron sputtering

Physica Status Solidi (B) Basic Research

Volumn 220, Issue 1, 2000, Pages 697-701

  Alba De Sanchez N ^a,b   Rincon C ^b   Zambrano, G ^a   Prieto, P ^a  

^a UNIVERSIDAD DEL VALLE   (Colombia)

^b UNIVERSIDAD AUTÓNOMA DE OCCIDENTE   (Colombia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0034215726     PISSN: 03701972     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3951(200007)220:1<697::AID-PSSB697>3.0.CO;2-Q     Document Type: Article

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