Plasmochemical Etching of GaAs in Chlorine-Argon Mixtures

Russian Microelectronics

Volumn 28, Issue 1, 1999, Pages 13-17

  Ovchinnikov, N L ^a   Svettsov, V I ^a   Efremov, A M ^a  

^a IVANOVO STATE UNIVERSITY OF CHEMISTRY AND TECHNOLOGY   (Russian Federation)

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EID: 0041783523     PISSN: 10637397     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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2. Plasma Processing for VLSI, Einspruch, N. G. and Brown, D.M., Eds., Orlando: Academic, 1984.
3. Svettsov, V.I., Shikova, T.A., and Chesnokova, T.A., Etching of Gallium Arsenide in Chlorine and Its Mixtures with Inert Gases, Fiz. Khim. Obrab. Mater., 1990, no. 1, pp. 90-93.
4. Efremov, A.M., Kupriyanovskaya, A.P., and Svettsov, V.I., Mechanisms of Argon Effect on the Rate of Plasmo-chemical Etching of Metals and Semiconductors in a Chlorine Plasma, Khim. Vys. Energ., 1993, vol. 27, no. 1, pp. 88-91.
5. 2 Binary Mixture Plasma, Khim. Vys. Energ., 1990, vol. 24, no. 4, pp. 356-360.
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7. Efremov, A.M., Ovchinnikov, N.L., and Svettsov, V.I., Silicon Etching in Chlorine and in a Chlorine-Argon Mixture at a Direct-Current Glow-Discharge Cathode, Materialy 12 Mezhdunarodnoi konferentsii "VIP-95" (Proc. 12th Int. Conf. "VIP-95"), Moscow, 1995, pp. 43-46.
8. Ivanov, Yu.A., Lebedev, Yu.A., and Polak, L.C., Metody kontaktnoi diagnostiki v neravnovesnoi plazmokhimii (Contact Diagnostics in Nonequilibrium Plasmochemistry), Moscow: Nauka, 1981.
9. Mantel, T.D. and Jbara, J.J., Low-Pressure Etching of GaAs with Multipolar Plasma Confinement, J. Appl. Phys., 1987, vol. 61, no. 10, pp. 4885-4888.
10. Slovetskii, D.I., Heterogeneous Reactions in a Nonequilibrium Low-Temperature Plasma, Khimiya Plazmy (Chemistry of Plasma), Smirnov, B.M., Ed., Moscow: Energoatomizdat, 1989, no. 15, pp. 208-266.
11. Efremov, A.M., Ovchinnikov, N.L., and Svettsov, V.I., Plasmochemical Etching of Gallium Arsenide in Chlorine, Fiz. Khim. Obrab. Mater., 1997, no. 1, pp. 47-51.
12. Efremov, A.M., Ovchinnikov, N.L., and Svettsov, V.I., Mechanisms of Interaction of a Chlorine-Argon Plasma with Metals and Semiconductors, Materialy 13 Mezlidunarodnoi konferentsii "VIP-97"(Proc. 13th Int. Conf. "VIP-97"), Moscow, 1997, vol. 2, pp. 142-144.