Plasmochemical etching of gallium arsenide in chlorine

Fizika i Khimiya Obrabotki Materialov

Volumn , Issue 1, 1997, Pages 47-51

  Efremov, A M ^a   Ovchinnikov, N L ^a   Svetsov, V I ^a  

^a Ivanovskaya Gosudarstvennaya   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; EMISSION SPECTROSCOPY; ETCHING; GALLIUM COMPOUNDS; PLASMA ETCHING; REACTION KINETICS;

CHLORINE PLASMA; GALLIUM ARSENIDE;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0030622943     PISSN: 00153214     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)