A One-Step Single-Cleaning Solution for CMOS Processes

Journal of the Electrochemical Society

Volumn 150, Issue 9, 2003, Pages

  Chao, T S ^a,b   Yeh, C H ^c   Pan, T M ^a   Lei, T F ^a   Li, Y H ^d  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^d Merck Kanto Advanced Chemicals Ltd   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; IMPURITIES; MIXTURES; SEMICONDUCTOR DEVICE MANUFACTURE;

CLEANING METHODS;

CMOS INTEGRATED CIRCUITS;

EID: 0041779977     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1593048     Document Type: Article

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