A New Figure Fracturing Algorithm for Variable-Shaped EB Exposure-Data Generation

Electronics and Communications in Japan, Part III: Fundamental Electronic Science (English translation of Denshi Tsushin Gakkai Ronbunshi)

Volumn 83, Issue 8, 2000, Pages 87-102

  Nakao, Hiroomi ^a   Terai, Masayuki ^a   Moriizumi, Koichi ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Electron beam exposure; Figure fracturing

Indexed keywords

EID: 0041729281     PISSN: 10420967     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1520-6440(200008)83:8<87::AID-ECJC10>3.0.CO;2-1     Document Type: Article

References (6)

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3. Moriizumi K, Taoka H, Ueyama K, Morimoto H, Munakata T. High-quality drawing data preparation for variable-shape EB drawing system (I) - Fracturing algorithm. Proc 55th Aut Conv Soc Appl Phys p 565, 1994.
4. Nakao H, Moriizumi K, Kamiyama K, Terai M, Miwa H. A new figure fracturing algorithm for variable-shaped EB exposure-data generation. Proc SPIE, Kawasaki 1996;2793:398-409.
5. Asano T. Computed geometry. Asakura Shoten; 1990.
6. Ohno Y, translator. Data structure and algorithm. Baifukan; 1987.