A new figure fracturing algorithm for high quality variable-shaped eb exposure-data generation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2793, Issue , 1996, Pages 398-409

  Nakao, Hiroomi ^a   Moriizumi, Koichi ^b   Kamiyama, Kinya ^b   Terai, Masayuki ^a   Miwa, Hisaharu ^b  

^a System LSI Development Center   (Japan)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Dimension accuracy; Eb exposure data generation; Figure fracturing

Indexed keywords

GRAPH ALGORITHMS; GRAPHIC METHODS; MASKS; PHOTOMASKS; X RAYS;

DIMENSION ACCURACY; EFFECTIVE FUNCTION; EXPOSURE DATA; HIGH QUALITY; LAYOUT DESIGNS; MASK PATTERNS; PROCESSING TIME; SET OF LINES;

FRACTURE;

EID: 85079270762     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.245230     Document Type: Conference Paper

References (3)

1. K. Moriizumi et. al, "High-Quality Pattern-Data Preparation Method for Variable-Shaped EB System(1)-Fracturing Algorithm-, " Extended Abstracts of the 55th Autumn Meeting, 1994, The Japan Society of Applied Physics.( in Japanese).
2. T. Asano et. al, "Partitioning a Polygonal Region into Trapezoids, " J.ACM, vol33, pp.291-312, 1986.
3. T Ohtsuki, "Minimum Dissection of Rectilinear Region, " ISCAS '82, pp. 1210-1213, 1982.