Photocatalytic decomposition of alkylsiloxane self-assembled monolayers on titanium oxide surfaces

Journal of Physical Chemistry B

Volumn 107, Issue 34, 2003, Pages 8997-9002

  Lee, Jae P ^a   Kim, Hee K ^a   Park, Chan R ^a   Park, Gyoosoon ^a   Kwak, Hyon T ^a   Koo, Sang M ^b   Sung, Myung M ^a  

^a Kookmin University   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATALYSIS; CATALYSTS; CONTACT ANGLE; DECOMPOSITION; OXIDATION; PHOTOCHEMICAL REACTIONS; SILICA; SURFACE CHEMISTRY; THIN FILMS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

ALKYL CHAIN; ALKYLSILOXANE; ATOMIC LAYER DEPOSITION; CONTACT ANGLE ANALYSIS; OCTADECYLTRICHLOROSILANE; PHOTOCATALYST; PHOTOCATALYTIC DECOMPOSITION; PHOTOCATALYTIC OXIDATION; SELF-ASSEMBLED MONOLAYER; TITANIUM ISOPROPOXIDE;

MONOLAYERS;

EID: 0041694324     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp030077k     Document Type: Article

References (24)

1. Ulman, A. An Introduction to Ultrathin Organic Films; Academic Press: Boston, MA, 1991.
2. Swalen, J. D.; Allara, D. L.; Andrade, J. D.; Chandross, E. A.; Garoff, S.; Israelachvili, J.; McCathy, T. J.; Murray, R.; Pease, R. F.; Rabolt, J. F.; Wynne, K. J.; Yu, H. Langmuir 1987, 3, 932.
3. Jennings, G. K.; Laibinis, P. E. Colloids Surf., A 1996, 116, 105.
4. Carr, D. W.; Lercel, M. J.; Whelan, C. S.; Craighead, H. G.; Seshadri, K.; Allara, D. L. J. Vac. Sci. Technol., A 1997, 15, 1446.
5. Huang, J. Y.; Hemminger, D. A. Langmuir 1994, 10, 626.
6. Xu, S.; Liu, G. Langmuir 1997, 13, 127.
7. Poirier, G. E.; Herne, T. M.; Miller, C. C.; Tarlov, M. J. J. Am. Chem. Soc. 1999, 121, 9703.
8. Tao, Y.; Wynn, D.; Dudek, R.; Borguet, E. Langmuir 2001. 17, 4497.
9. Photocatalysis Fundamentals and Applications; Serpone, N., Pelizzetti, Eds.; Wilet: Amsterdam, 1989.
10. Photocatalytic Purification and Treatment of Water and Air, Ollis, D. F., Al-Ekabi, Eds.; Elsevier: Amsterdam, 1993.
11. Fuhishima, A.; Honda, K. Nature 1972, 238, 37.
12. Ishibashi, K.; Nosaka, Y.; Hashimoto, K.; Fujishima, A. J. Phys. Chem. B 1998, 102, 2118.
13. Saka, T.; Kawai, T. Chem. Phys. Lett. 1981, 80, 341.
14. Turchi, C. S.; Ollis, D. F. J. Catal. 1990, 122, 178.
15. Haick, H.; Paz, Y. J. Phys. Chem. B 2001, 105, 3045.
16. Ishizaka, A.; Shiraki, Y. J. Electrochem. Soc. 1986, 133, 666.
17. Kumar, A.; Whitesides, G. M. Appl. Phys. Lett. 1993, 63, 2002.
18. Kumar, A.; Biebuyck, H.; Whitesides, G. M. Langmuir 1994, 10, 1498.
19. Wilbur, J. L.; Kumar, A.; Kim, E.; Whitesides, G. M. Adv. Mater. 1994, 6, 600.
20. Brzoska, J. B.; Ben Azouz, I.; Rondelez, F. Langmuir 1994, 10, 4367.
21. Sung, M. M.; Carraro, C.; Yauw, O. W.; Kim, Y.; Maboudian, R. J. Phys. Chem. 2000, 104, 1556.
22. Brinker, C. J.; Scherer, G. W. Sol-Gel Science; Academic Press: New York, 1990.
23. Briggs, D.; Seah, M. P. Practical Surface Analysis; John Wiley & Sons Ltd.: England, 1990.
24. Cox, R.; Patrick, K.; Chant, S. Environ. Sci. Technol. 1981, 15, 587.