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Journal of Applied Physics

Volumn 88, Issue 1, 2000, Pages 550-554

Behavior of hydrogen intentionally introduced by plasma into metalorganic vapor phase epitaxy grown CdTe:As layers

(7) Pelletier, H a Theys, B a Lusson, A a Cote, D b Rommeluere J F a Jomard, F a Dolin, C a

a CNRS (France)

b SORBONNE UNIVERSITÉ (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041687525 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.373694 Document Type: Article

Times cited : (3)

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