SCOPUS 정보 검색 플랫폼

Volumn 256, Issue 3-4, 2003, Pages 261-265

Reduction of oxygen during the crystal growth in heavily antimony-doped Czochralski silicon

(5) Yang, Deren a Li, Chunlong a Luo, Muchang a Xu, Jin a Que, Duanlin a

Author keywords

A1. Doping; A1. Oxygen; A2. Czochralski method; A2. Growth from melt; A2. Single crystal growth; B2. Semiconducting silicon

Indexed keywords

AMORPHOUS MATERIALS; ANTIMONY; EVAPORATION; OXYGEN; REDUCTION; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SINGLE CRYSTALS; THERMODYNAMICS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTAL PULLERS;

CRYSTAL GROWTH FROM MELT;

EID: 0041669365 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-0248(03)01372-1 Document Type: Article

Times cited : (7)

References (13)

1
- 0026852778
- Gupta S., Messoloras S., Schnelder J.R., Stewart R.J., Zulehner W. Semicond. Sci. Technol. 7:1992;443.
- (1992) Semicond. Sci. Technol. , vol.7 , pp. 443
- Gupta, S.¹ Messoloras, S.² Schnelder, J.R.³ Stewart, R.J.⁴ Zulehner, W.⁵

2
- 0041620075
- Nozaki T., Itoh Y., Masui T., Abe T. J. Appl. Phys. 59:1986;2562.
- (1986) J. Appl. Phys. , vol.59 , pp. 2562
- Nozaki, T.¹ Itoh, Y.² Masui, T.³ Abe, T.⁴

3
- 84975402176
- The Electrochemical Society, Pennington, NJ
- H. Walitzki, H.J. Rath, J. Reffle, S. Pahlke, M. Blatte, Semiconductor Silicon, The Electrochemical Society, Pennington, NJ. 1986, p. 86.
- (1986) Semiconductor Silicon , pp. 86
- Walitzki, H.¹ Rath, H.J.² Reffle, J.³ Pahlke, S.⁴ Blatte, M.⁵

4
- 0028761985
- Xu Y., CLiu Y.Li, Zhu Z., Wei C. J. Crystal Growth. 144:1994;173.
- (1994) J. Crystal Growth , vol.144 , pp. 173
- Xu, Y.¹ Li, Y.² Liu, C.³ Zhu, Z.⁴ Wei, C.⁵

5
- 0042622069
- The Electrochemical Society, Pennington, NJ
- F. Shimura, W. Dyson, J. W. Moody R. S. Hockett, in: VLSI Science and Technology 1985, The Electrochemical Society, Pennington, NJ. 1985, p. 57.
- (1985) VLSI Science and Technology 1985 , pp. 57
- Shimura, F.¹ Dyson, W.² Moody, J.W.³ Hockett, R.S.⁴

6
- 0043122845
- The Electrochemical Society, Pennington, NJ
- H. Harada, T. Itoh, N. Ozawa, VLSI Science and Technology, The Electrochemical Society, Pennington, NJ. 1985, p. 526.
- (1985) VLSI Science and Technology , pp. 526
- Harada, H.¹ Itoh, T.² Ozawa, N.³

7
- 0032777138
- Liu C., Wang H., Li Y., Wang Q., Ren B., Xu Y., Que Q. J. Crystal Growth. 196:1999;111.
- (1999) J. Crystal Growth , vol.196 , pp. 111
- Liu, C.¹ Wang, H.² Li, Y.³ Wang, Q.⁴ Ren, B.⁵ Xu, Y.⁶ Que, Q.⁷

8
- 0026837804
- Liu Z., Carlberg T. J. Electrochem. Soc. 139:1992;844.
- (1992) J. Electrochem. Soc. , vol.139 , pp. 844
- Liu, Z.¹ Carlberg, T.²

9
- 21544446903
- Borghesi A., Pivac B., Sassella A., Stella A. J. Appl. Phys. 77:1995;4169.
- (1995) J. Appl. Phys. , vol.77 , pp. 4169
- Borghesi, A.¹ Pivac, B.² Sassella, A.³ Stella, A.⁴

10
- 0042622066
- The Science Press, Beijing, China, in Chinese
- T. Cao, B. Guo, Series of Inorganic Chemistry, Vol. 4, The Science Press, Beijing, China, 1998 (in Chinese).
- (1998) Series of Inorganic Chemistry , vol.4
- Cao, T.¹ Guo, B.²

11
- 22844447675
- Metallurgical Industry Press, Beijing, China, in Chinese
- D. Ye, Handbook of Practical Inorganic Matter Thermodynamic Data, Metallurgical Industry Press, Beijing, China, 1981 (in Chinese).
- (1981) Handbook of Practical Inorganic Matter Thermodynamic Data
- Ye, D.¹

12
- 0033893671
- Zulehner W. Mater. Sci. Eng. B. 73:2000;7.
- (2000) Mater. Sci. Eng. B. , vol.73 , pp. 7
- Zulehner, W.¹

13
- 0037296934
- Kalaev V.V., Evstratov I.Yu., Makarov Yu.N. J. Crystal Growth. 249:2003;87.
- (2003) J. Crystal Growth , vol.249 , pp. 87
- Kalaev, V.V.¹ Evstratov, I.Yu.² Makarov, Yu.N.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.