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Volumn 68, Issue 1-3, 1998, Pages 410-413

Wafer-to-wafer fusion bonding of oxidized silicon to silicon at low temperatures

Author keywords

Fusion bonding; Low temperature bonding; Oxide to silicon bonding

Indexed keywords

BOND STRENGTH (MATERIALS); BONDING; ELECTRIC INSULATION; LOW TEMPERATURE OPERATIONS; SILICA; SURFACE TREATMENT;

EID: 0041636157     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00028-4     Document Type: Article
Times cited : (48)

References (9)
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    • Mueller, B.1    Stoffel, A.2
  • 3
    • 0028550952 scopus 로고
    • A kinetics study of the strength of direct bonded wafers
    • S.N. Farrens, C.E. Hunt, B.E. Roberds, J.K. Smith, A kinetics study of the strength of direct bonded wafers, J. Electrochem. Soc. 141 (11) (1994) 3225-3230.
    • (1994) J. Electrochem. Soc. , vol.141 , Issue.11 , pp. 3225-3230
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  • 4
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    • Bond strength of bonded SOI wafers
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    • (1992) Jpn. J. Appl. Phys. , vol.31 , Issue.4 , pp. 975-978
    • Sugimoto, F.1    Arimoto, Y.2
  • 5
    • 0004367815 scopus 로고
    • Silicon wafer bonding studied by infrared absorption spectroscopy
    • D. Feijoo, Y.J. Chabal, S.B. Christman, Silicon wafer bonding studied by infrared absorption spectroscopy, Appl. Phys. Lett. 65 (20) (1994) 2548-2550.
    • (1994) Appl. Phys. Lett. , vol.65 , Issue.20 , pp. 2548-2550
    • Feijoo, D.1    Chabal, Y.J.2    Christman, S.B.3
  • 8
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    • A model for the silicon wafer bonding process
    • R. Stengl, T. Tan, U. Goesele, A model for the silicon wafer bonding process, Jpn. J. Appl. Phys. 28 (1989) 1735-1741.
    • (1989) Jpn. J. Appl. Phys. , vol.28 , pp. 1735-1741
    • Stengl, R.1    Tan, T.2    Goesele, U.3
  • 9
    • 0011127649 scopus 로고
    • Water at interfaces: Molecular structure and dynamics
    • K. Klier, A.C. Zettlemoyer, Water at interfaces: molecular structure and dynamics, J. Colloid Interface Sci. 58 (1977) 216-229.
    • (1977) J. Colloid Interface Sci. , vol.58 , pp. 216-229
    • Klier, K.1    Zettlemoyer, A.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.