Unusual adsorption kinetics of formic acid on Cu(1 0 0) studied by dc resistance and nonresonant infrared reflectance changes

Surface Science

Volumn 542, Issue 1-2, 2003, Pages 120-128

  Hsu, Ching Ling ^a,b   McCullen, E F ^a,c   Tobin, R G ^a  

^a TUFTS UNIVERSITY   (United States)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c WAYNE STATE UNIVERSITY   (United States)

Author keywords

Adsorption kinetics; Chemisorption; Copper; Electrical transport (conductivity, resistivity, mobility, etc.); Electrical transport measurements; Infrared absorption spectroscopy; Metallic surfaces; Sticking

Indexed keywords

ADSORPTION; CARBOXYLIC ACIDS; CHEMISORPTION; ELECTRIC CONDUCTIVITY; ELECTROMAGNETIC WAVE REFLECTION; ELECTRON TRANSPORT PROPERTIES; INFRARED SPECTROSCOPY; MONOLAYERS;

METALLIC SURFACES;

SURFACE REACTIONS;

EID: 0041418376     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00979-8     Document Type: Article

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