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Volumn 16, Issue 3, 2003, Pages 365-369

Evolution of T-shaped gate lithography for compound semiconductors field-effect transistors

Author keywords

Field effect transistor; GaAs; T shaped gate

Indexed keywords

COPOLYMERS; ELECTRON BEAM LITHOGRAPHY; FIELD EFFECT TRANSISTORS; GATES (TRANSISTOR); OPTIMIZATION; PHOTORESISTS; POLYMETHYL METHACRYLATES; SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0041385602     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2003.815632     Document Type: Article
Times cited : (5)

References (7)
  • 1
    • 0024907352 scopus 로고    scopus 로고
    • Sub-quarter micron gate length high electron mobility transistors processing technology
    • Y. Ynag, "Sub-quarter micron gate length high electron mobility transistors processing technology," in Proc. Millemeter wave Far-infrared Technol., ICMWFT, 1989, pp. 532-535.
    • Proc. Millemeter Wave Far-Infrared Technol., ICMWFT, 1989 , pp. 532-535
    • Ynag, Y.1
  • 3
    • 0042895451 scopus 로고    scopus 로고
    • A very high performance, high yield, and high throughput millimeter wave power pHEMT process technology
    • K. Alavi, D. Shaw, A. Platzker, B. Rizzi, S. Ogut, and R. Puente, "A very high performance, high yield, and high throughput millimeter wave power pHEMT process technology," in Proc. GaAs MANTECH, 2001, pp. 105-107.
    • Proc. GaAs MANTECH, 2001 , pp. 105-107
    • Alavi, K.1    Shaw, D.2    Platzker, A.3    Rizzi, B.4    Ogut, S.5    Puente, R.6
  • 6
    • 0042559635 scopus 로고    scopus 로고
    • Optical lithography performance and resolution using strong dark-field phase-shifting of discrete patterns
    • J. S. Peterson and D. Gerold, "Optical lithography performance and resolution using strong dark-field phase-shifting of discrete patterns," in Proc. GaAs MANTECH, 2001, pp. 102-104.
    • Proc. GaAs MANTECH, 2001 , pp. 102-104
    • Peterson, J.S.1    Gerold, D.2
  • 7
    • 0011231696 scopus 로고
    • Fabrication of 0.1 μm T-shaped gates by phase-shifting optical lithography
    • H.-Y. Liu, C.-y. Su, N. R. Farrar, and R. Gleason, "Fabrication of 0.1 μm T-shaped gates by phase-shifting optical lithography," in Proc. SPIE, vol. 1927, 1993, pp. 42-52.
    • (1993) Proc. SPIE , vol.1927 , pp. 42-52
    • Liu, H.-Y.1    Su, C.-Y.2    Farrar, N.R.3    Gleason, R.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.