-
1
-
-
0024907352
-
Sub-quarter micron gate length high electron mobility transistors processing technology
-
Y. Ynag, "Sub-quarter micron gate length high electron mobility transistors processing technology," in Proc. Millemeter wave Far-infrared Technol., ICMWFT, 1989, pp. 532-535.
-
Proc. Millemeter Wave Far-Infrared Technol., ICMWFT, 1989
, pp. 532-535
-
-
Ynag, Y.1
-
2
-
-
0033079811
-
Extremely low noise performance of GaAs MESFET's with wide-head T-shaped gate
-
Feb.
-
K. Onodera, K. Nishimura, S. Aoyama, S. Sugitani, Y. Yamane, and M. Hirano, "Extremely low noise performance of GaAs MESFET's with wide-head T-shaped gate," IEEE Trans. Electron Devices, vol. 46, pp. 310-319, Feb. 1999.
-
(1999)
IEEE Trans. Electron Devices
, vol.46
, pp. 310-319
-
-
Onodera, K.1
Nishimura, K.2
Aoyama, S.3
Sugitani, S.4
Yamane, Y.5
Hirano, M.6
-
3
-
-
0042895451
-
A very high performance, high yield, and high throughput millimeter wave power pHEMT process technology
-
K. Alavi, D. Shaw, A. Platzker, B. Rizzi, S. Ogut, and R. Puente, "A very high performance, high yield, and high throughput millimeter wave power pHEMT process technology," in Proc. GaAs MANTECH, 2001, pp. 105-107.
-
Proc. GaAs MANTECH, 2001
, pp. 105-107
-
-
Alavi, K.1
Shaw, D.2
Platzker, A.3
Rizzi, B.4
Ogut, S.5
Puente, R.6
-
4
-
-
0033689551
-
Advanced microlithography process with chemical shrink
-
paper 94
-
T. Kanda, H. Tanak, Y. Kinoshita, N. Watase, R. Eakin, T. Ishibashi, T. Toyoshima, N. Yasuda, and M. Tanaka, "Advanced microlithography process with chemical shrink," in Proc. SPIE, Advances in Resist Technology and Processing XVII, vol. 3999, 2000, paper 94.
-
(2000)
Proc. SPIE, Advances in Resist Technology and Processing XVII
, vol.3999
-
-
Kanda, T.1
Tanak, H.2
Kinoshita, Y.3
Watase, N.4
Eakin, R.5
Ishibashi, T.6
Toyoshima, T.7
Yasuda, N.8
Tanaka, M.9
-
5
-
-
84887497156
-
Dielectrically defined optical Tee-gate for high power GaAs pHEMTs
-
D. Fanning, L. Withowski, J. Stidham, H.-Q. Tserng, M. Muir, and P. Saunier, "Dielectrically defined optical Tee-gate for high power GaAs pHEMTs," in Proc. GaAs MANTECH, 2002, pp. 83-86.
-
Proc. GaAs MANTECH, 2002
, pp. 83-86
-
-
Fanning, D.1
Withowski, L.2
Stidham, J.3
Tserng, H.-Q.4
Muir, M.5
Saunier, P.6
-
6
-
-
0042559635
-
Optical lithography performance and resolution using strong dark-field phase-shifting of discrete patterns
-
J. S. Peterson and D. Gerold, "Optical lithography performance and resolution using strong dark-field phase-shifting of discrete patterns," in Proc. GaAs MANTECH, 2001, pp. 102-104.
-
Proc. GaAs MANTECH, 2001
, pp. 102-104
-
-
Peterson, J.S.1
Gerold, D.2
-
7
-
-
0011231696
-
Fabrication of 0.1 μm T-shaped gates by phase-shifting optical lithography
-
H.-Y. Liu, C.-y. Su, N. R. Farrar, and R. Gleason, "Fabrication of 0.1 μm T-shaped gates by phase-shifting optical lithography," in Proc. SPIE, vol. 1927, 1993, pp. 42-52.
-
(1993)
Proc. SPIE
, vol.1927
, pp. 42-52
-
-
Liu, H.-Y.1
Su, C.-Y.2
Farrar, N.R.3
Gleason, R.4
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