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Volumn 16, Issue 2, 1998, Pages 736-742

Improvement of the cantilever beam technique for stress measurement during the physical vapor deposition process

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0032369676     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581053     Document Type: Article
Times cited : (37)

References (35)
  • 11
    • 0000293935 scopus 로고
    • edited by G. Mass and R. E. Thun Academic, New York
    • R. W. Hoffman, in Physics of Thin Films, edited by G. Mass and R. E. Thun (Academic, New York, 1966), Vol. 3, pp. 211-273.
    • (1966) Physics of Thin Films , vol.3 , pp. 211-273
    • Hoffman, R.W.1
  • 14
    • 85034283497 scopus 로고
    • edited L. I. Maissel and R. Glang McGraw-Hill, New York, Chap. 12
    • D. S. Campbell, in Handbook of Thin Film Technology, edited L. I. Maissel and R. Glang (McGraw-Hill, New York, 1970), Chap. 12.
    • (1970) Handbook of Thin Film Technology
    • Campbell, D.S.1
  • 30


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.