Metal-organic precursors and chemical vapor deposition;Précurseurs « métalloorganiques » et dépôt chimique à partir d'une phase gazeuse

Actualite Chimique

Volumn , Issue 2, 1999, Pages 14-21

  Valade, Lydie ^a   Teyssandier, Francis ^b  

^a LCC LABORATOIRE DE CHIMIE DE COORDINATION   (France)

^b UNIVERSITÉ DE PERPIGNAN   (France)

Author keywords

Chemical vapor deposition; Coordination chemistry; Metal organic precursors; MOCVD; Thin films

Indexed keywords

EID: 0040710747     PISSN: 01519093     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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