Kinetic and topographic investigation of copper deposition/stripping in an acid copper environment

Electrochemistry Communications

Volumn 1, Issue 9, 1999, Pages 398-401

  Hartig, P ^a   Wunsche M ^a   Kussner T ^a   Schumacher, R ^a  

^a ATOTECH DEUTSCHLAND GMBH   (Germany)

Author keywords

Copper deposition; Copper stripping; Electrode kinetics; Quartz crystal microbalance; Topography; Under potential deposition

Indexed keywords

EID: 0040320143     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1388-2481(99)00081-8     Document Type: Article

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