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Volumn 78, Issue 25, 2001, Pages 3995-3997
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Direct measurement of sub-10 nm-level lateral distribution in tunneling-electron luminescence intensity on a cross-sectional 50-nm-thick AlAs layer by using a conductive transparent tip
a
NTT CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0040158796
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1380404 Document Type: Article |
Times cited : (11)
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References (10)
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