Influence of RF plasma properties on the deposited PACVD CNx layers

Surface and Coatings Technology

Volumn 97, Issue 1-3, 1997, Pages 109-113

  Gruger H ^a   Selbmann, D ^a   Wolf, E ^a   Leonhardt, A ^a  

^a IFW DRESDEN   (Germany)

Author keywords

Carbon nitride; CNx; OES; PACVD

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; EMISSION SPECTROSCOPY; PLASMA APPLICATIONS; REACTION KINETICS; SUBSTRATES;

CARBON NITRIDE; OPTICAL EMISSION SPECTROSCOPY;

CARBON INORGANIC COMPOUNDS;

EID: 0040084762     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00411-8     Document Type: Article

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