Influence of defects on the photoluminescence of pulsed-laser deposited Er-doped amorphous Al2O3 films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 166, Issue , 2000, Pages 793-797

  Jimenez De Castro M ^a   Serna, R ^a   Chaos, J A ^a   Afonso, C N ^a   Hodgson, E R ^b  

^a INSTITUTO DE ÓPTICA   (Spain)

^b CIEMAT   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANNEALING; DEPOSITION; DOPING (ADDITIVES); ELECTRON IRRADIATION; ERBIUM; HIGH TEMPERATURE EFFECTS; PHOTOLUMINESCENCE; PULSED LASER APPLICATIONS; RADIATION DAMAGE;

PULSED LASER DEPOSITION (PLD);

AMORPHOUS FILMS;

EID: 0039695577     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)01178-7     Document Type: Article

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