Optical absorption in alloys of Si, Ge, C, and Sn

Journal of Applied Physics

Volumn 79, Issue 11, 1996, Pages 8656-8659

  Orner, B A ^a   Hits, D ^a   Kolodzey, J ^a   Guarin, F J ^b   Powell, A R ^c   Iyer, S S ^d  

^a UNIVERSITY OF DELAWARE   (United States)

^b IBM MICROELECTRONICS   (United States)

^c Advanced Technology Materials Inc   (United States)

^d SiBond LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039650634     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362489     Document Type: Review

References (23)

1. J. C. Bean, Proc. IEEE 80, 571 (1992).
2. R. A. Soref, Proc. IEEE 81, 1687 (1993).
3. R. I. Scace and G. A. Slack, J. Chem. Phys. 30, 1551 (1959).
4. A. G. Milnes, Deep Impurities in Semiconductors (Wiley, New York, 1973).
5. K. Eberl, S. S. Iyer, S. Zollner, J. C. Tsang, and F. K. LeGoues, Appl. Phys. Lett. 60, 3033 (1992).
6. J. W. Strane, H. J. Stein, S. R. Lee, B. L. Doyle, S. T. Picraux, and J. W. Mayer, Appl. Phys. Lett. 63, 2786 (1993).
7. P. Boucaud, C. Francis, F. H. Julien, J. M. Lourtoiz, D. Bouchier, S. Bodnar, B. Lambert, and J. Regolini, Appl. Phys. Lett. 64, 875 (1994).
8. R. A. Soref, J. Appl. Phys. 70, 2470 (1991).
9. R. A. Soref and C. H. Perry, J. Appl. Phys. 69, 539 (1991).
10. A. A. Demkov and O. F. Sankey, Phys. Rev. B 48, 2207 (1993).
11. J. Gryko and O. F. Sankey, Phys. Rev. B 51, 7295 (1995).
12. J. Xie, K. Zhang, and X. Xie, J. Appl. Phys. 77, 3868 (1995).
13. R. Braunstein, A. R. Moore, and F. Herman, Phys. Rev. 109, 695 (1958).
14. E. R. Johnson and S. M. Christian, Phys. Rev. 95, 560 (1954).
15. J. Kolodzey, P. R. Berger, B. A. Orner, D. Hits, F. Chen, A. Khan, X. Shao, M. Waite, S. I. Shah, C. P. Swann, and K. M. Unruh, J. Cryst. Growth 157, 386 (1995).
16. A. St. Amour, C. W. Liu, J. C. Sturm, Y. Lacroix, and M. L. W. Thewalt, Appl. Phys. Lett. 67, 3915 (1995).
17. K. Brunner, K. Eberl, and W. Winter, Phys. Rev. Lett. 76, 303 (1996).
18. J. Kolodzey, P. A. O'Neil, S. Zhang, B. Orner, K. Roe, K. Unruh, C. Swann, M. Waite, and S. I. Shah, Appl. Phys. Lett. 67, 1865 (1995).
19. B. A. Orner, A. Khan, D. Hits, F. Chen, K. Roe, J. Pickett, X. Shao, R. G. Wilson, P. R. Berger, and J. Kolodzey, J. Electron. Mater. 25, 297 (1996).
20. ORIGIN, Microcal Software, Incorporated.
21. Landolt-Bornstein: Numerical Data and Functional Relationships in Science and Technology, Group III, edited by O. Madelung (Springer, Berlin, 1982), Vol. 17a.
22. J. Weber and M. I. Alonso, Phys. Rev. B 40, 5683 (1989).
23. C. G. Van De Walle and R. M. Martin, Phys. Rev. B 34, 5621 (1986).