Nucleation of highly oriented diamond on silicon

Metals and Materials International

Volumn 2, Issue 2, 1996, Pages 103-108

  Kim, Yoon Kee ^a   Lee, Ki Young ^a   Lee, Jai Young ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS VOLTAGE; CRYSTALLIZATION; DEPOSITION; DIAMOND FILMS; EMISSION SPECTROSCOPY; ETCHING; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HYDROCARBONS; HYDROGEN; NUCLEATION; SILICON; SILICON ON INSULATOR TECHNOLOGY;

BIAS ENHANCED NUCLEATION AND GROWTHS; BIAS-ENHANCED NUCLEATION; DEPOSITION CONDITIONS; HIGHLY ORIENTED DIAMONDS; HYDROCARBON RADICALS; METHANE CONCENTRATIONS; OPTICAL EMISSION SPECTRA; SUBSTRATE TEMPERATURE;

SUBSTRATES;

EID: 0039383749     PISSN: 12259438     EISSN: None     Source Type: Journal    
DOI: 10.1007/bf03025953     Document Type: Article

References (16)

1. K. Bigelow, in Proceedings of the 2nd International Conference on the Application of Diamond Films and Related Materials (eds., M. Yoshikawa, M. Murakawa, Y. Tzeng and W. A. Yarbrough), p. 5, MYUK, Tokyo, Japan (1993).
2. R. F. Davis, in Diamond Films and Coatings; Development, Properties and Applications, p. 1, Noyes Publications, New Jersey (1993).
3. M. Yoshikawa, H. Ishida, A. Ishitani, S. Koizumi and T. Inuzuka, Appl. Phys. Lett. 58, 1387 (1991).
4. A. Argoitia, J. C. Angus, J. S. Ma, L. Wang, P. Dirouz and W. R. L. Lambrecht, J. Mater. Res. 9, 1849 (1994).
5. T. Tsuno, T. Imai, Y. Nishibayashi, K. Hamada and N. Fujimori, Jpn. J. Appl. Phys. 30, 1063 (1991).
6. A. R. Badzian, T. Badzian, X. H. Wang and T. M. Hartnett, in Proceedings of 2nd International Conference on New Diamond and Technology, p. 549, MRS (1991).
7. X. Jiang, C.-P. Klages, M. Rler, R. Zachai, M. Hartweg and H. J. Fser, Appl. Phys. A57, 483 (1993).
8. B. R. Stoner, S. R. Sahaida, J. P. Bade, R. Southworth and P. J. Ellis, J. Mater. Res. 8, 1334 (1993).
9. S. D. Walter, B. R. Stoner, J. T. Glass, P. J. Ellis, D. S. Buhaenko, C. E. Jenkins and P. Southworth, Appl. Phys. Lett. 62, 1215 (1993).
10. X. Jiang, E. Boettger, M. Paul and C.-P. Klages, Appl. Phys. Lett. 65, 1519 (1994).
11. H. Maeda, M. Irie, T. Hino, K. Kusakabe and S. Morooka, J. Mater. Res. 10, 158 (1995).
12. P. John, D. K. Milne, P. G. Roberts, M. G. Jubber, M. Liehr and J. J. B. Wilson, J. Mater. Res. 9, 3083 (1994).
13. Y. K. Kim, K. Y. Lee and J. Y. Lee, Thin Solid Films, 272, 64 (1996).
14. Y. K. Kim, K. Y. Lee and J. Y. Lee, Appl. Phys. Lett. 68, 756 (1996).
15. Y. Shigesato, S. Takaki and T. Haranoh, J. Appl. Phys. 71, 3356 (1992).
16. A. Campargue, L. Fayette, B. Marcus, M. Chenevier, M. Mermoux and A. Rossi, Appl. Phys. Lett. 62, 134 (1993).