Structural characterization of rapid thermally oxidized silicon-germanium-carbon alloy films

Materials Science and Engineering: B

Volumn 75, Issue 2-3, 2000, Pages 184-186

  Choi, W K ^a   Bera, L K ^a   Chen, J H ^a   Feng, W ^a   Pey, K L ^a   Yoong, Hans ^b   Mi, J ^b   Zhang, Fan ^b   Yang, C Y ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b SANTA CLARA UNIVERSITY   (United States)

Author keywords

Raman spectroscopy; Rapid thermally oxidized film; Silicon germanium carbon alloy films; X ray diffraction spectroscopy

Indexed keywords

EID: 0039302680     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(00)00359-7     Document Type: Article

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