First monomeric, volatile bis-azide single-source precursor to gallium nitride thin films

Chemical Vapor Deposition

Volumn 2, Issue 2, 1996, Pages 51-55

  Miehr, Alexander ^a   Ambacher, Oliver ^a   Rieger, Walter ^a   Metzger, Thomas ^a   Born, Eberhard ^a   Fischer, Roland A ^a  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; FILM GROWTH; LATTICE CONSTANTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR DYNAMICS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GALLIUM COMPOUNDS; STABILIZATION; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION;

HYDRIDE VAPOR PHASE EPITAXY; INTRAMOLECULARLY BASED ADDUCT STABILIZATION; LOW TEMPERATURE DEPOSITION; MONOMERIC VOLATILE BISAZIDE SINGLE SOURCE PRECURSOR; PYROPHORIC PRECURSORS;

THIN FILMS;

EID: 0030106052     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.19960020206     Document Type: Article

References (22)